JPS6167255A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6167255A JPS6167255A JP59189146A JP18914684A JPS6167255A JP S6167255 A JPS6167255 A JP S6167255A JP 59189146 A JP59189146 A JP 59189146A JP 18914684 A JP18914684 A JP 18914684A JP S6167255 A JPS6167255 A JP S6167255A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- forming
- impurity
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/65—Integrated injection logic
- H10D84/658—Integrated injection logic integrated in combination with analog structures
Landscapes
- Bipolar Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59189146A JPS6167255A (ja) | 1984-09-10 | 1984-09-10 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59189146A JPS6167255A (ja) | 1984-09-10 | 1984-09-10 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6167255A true JPS6167255A (ja) | 1986-04-07 |
JPH0436578B2 JPH0436578B2 (en]) | 1992-06-16 |
Family
ID=16236188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59189146A Granted JPS6167255A (ja) | 1984-09-10 | 1984-09-10 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6167255A (en]) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5330922A (en) * | 1989-09-25 | 1994-07-19 | Texas Instruments Incorporated | Semiconductor process for manufacturing semiconductor devices with increased operating voltages |
US6593629B2 (en) * | 2000-12-28 | 2003-07-15 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
-
1984
- 1984-09-10 JP JP59189146A patent/JPS6167255A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5330922A (en) * | 1989-09-25 | 1994-07-19 | Texas Instruments Incorporated | Semiconductor process for manufacturing semiconductor devices with increased operating voltages |
US5408125A (en) * | 1989-09-25 | 1995-04-18 | Texas Instruments Incorporated | Semiconductor process for manufacturing semiconductor device with increased operating voltages |
US6593629B2 (en) * | 2000-12-28 | 2003-07-15 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPH0436578B2 (en]) | 1992-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4038680A (en) | Semiconductor integrated circuit device | |
US5304821A (en) | MOS-gate-turnoff thyristor | |
US4980305A (en) | Method of manufacturing bipolar transistor | |
US4933737A (en) | Polysilon contacts to IC mesas | |
KR910006672B1 (ko) | 반도체 집적회로 장치 및 그의 제조 방법 | |
US4005453A (en) | Semiconductor device with isolated circuit elements and method of making | |
JP3905929B2 (ja) | 半導体装置 | |
JPS6167255A (ja) | 半導体装置の製造方法 | |
US4599635A (en) | Semiconductor integrated circuit device and method of producing same | |
JPS6133261B2 (en]) | ||
JPH0258865A (ja) | 半導体装置 | |
US5777376A (en) | Pnp-type bipolar transistor | |
US4122482A (en) | Vertical complementary bipolar transistor device with epitaxial base zones | |
JP2752655B2 (ja) | バイポーラ集積回路装置 | |
JPH10189755A (ja) | 半導体装置及びその製造方法 | |
JPH061814B2 (ja) | 半導体装置 | |
JPS6140140B2 (en]) | ||
KR100332115B1 (ko) | 반도체전력소자및그제조방법 | |
JPS61228664A (ja) | 半導体装置 | |
KR100206579B1 (ko) | 집적 주입 논리(i l) 소자 및 그 제조 방법 | |
KR940009359B1 (ko) | 바이씨모스(bicmos)의 구조 및 제조방법 | |
JPS6152575B2 (en]) | ||
JPS61244060A (ja) | 半導体装置 | |
JPH01246873A (ja) | 半導体装置 | |
JPS6211511B2 (en]) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |